Linde is the first and global choice for electronic specialty gases. Our extensive process knowledge ensures that our products exceed your most stringent purity and consistency demands.
- 14 Products
As a gas the special properties of Helium are used in many industries and processes such as semiconductor manufacturing and nanotechnology.
High purity Oxygen is used for the formation of silicon dioxide and metal oxide, as an etchant for photoresist, and in mixtures with halocarbons for etching silicon. High purity Oxygen is also used in the optical fibre production process.
Diclorosilane is used as a silicon source for low pressure chemical vapour deposition of polysilicon, silicon dioxide, silicon nitride and epitaxial silicon.
The SDS (Safe Delivery Source) technology uses an adsorbent material to store pure Phosphine gas at sub-atmospheric pressure levels. The dopant gas is extracted by the pressure differential between the SDS cylinder and the ion implant chamber.
The revolutionary SDS2 Boron Trifluoride Safe Delivery Source addresses the concerns of a high pressure system by delivering greater than 99.9% pure boron trifluoride gas at a pressure below one atmosphere.
Halocarbon C318 (octafluorocyclobutane) is used as a deposition gas and etchant in the production of semiconductor materials and devices.
Nitrogen is used in the electronics industry for inerting of epitaxial reactors, as a purge or carrier gas, as well as blanketing applications.
Arsine is used in conjunction with organometallic compounds and as a carrier gas in the epitaxial growth of compound semiconductors: most commonly with trimethyl gallium to product gallium arsenide (GaAs).
Sulphur Hexafluoride is used as a plasma etching gas.
Halocarbon 14 is a selective etching agent for many metals, metal silicides and oxides.